DIFFUSED Datasheet(PDF) - MJE5555 - KEC(Korea Electronics)

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DIFFUSED Datasheet, PDF

Searched Keyword : 'DIFFUSED' - Total: 2601 (10/131) Pages

Manufacturer	Part #	Datasheet	Description
KEC(Korea Electronics)	MJE5555	446Kb/2P	TRIPLE DIFFUSED NPN TRANSISTOR
KEC(Korea Electronics)	MJE13003HV	445Kb/2P	TRIPLE DIFFUSED NPN TRANSISTOR
Hitachi Semiconductor	2SB1079	36Kb/6P	Silicon PNP Triple Diffused
Hitachi Semiconductor	2SD476	32Kb/5P	Silicon NPN Triple Diffused
NXP Semiconductors	BUX46	331Kb/7P	SILICON DIFFUSED POWER TRANSISTORS July 1988
NXP Semiconductors	BUJ303B	54Kb/7P	Silicon Diffused Power Transistor March 2002-Rev 1.000
Hitachi Semiconductor	2SC4897	21Kb/4P	Silicon NPN Triple Diffused
Hitachi Semiconductor	2SC4789	20Kb/4P	Silicon NPN Triple Diffused
NXP Semiconductors	BU2525AF	70Kb/7P	Silicon Diffused Power Transistor September 1997 Rev 1.400
	BU2527AX	72Kb/7P	Silicon Diffused Power Transistor September 1997 Rev 2.200
	BU2532AL	60Kb/6P	Silicon Diffused Power Transistor September 1997 Rev 1.100
	BU2720AX	75Kb/7P	Silicon Diffused Power Transistor September 1997 Rev 1.200
	BU2720DX	73Kb/7P	Silicon Diffused Power Transistor September 1997 Rev 1.300
	BU2722DF	54Kb/7P	Silicon Diffused Power Transistor November 1995 Rev 1.000
	BU2730AL	20Kb/4P	Silicon Diffused Power Transistor April 1997 Rev 1.000
	BU4506AF	44Kb/6P	Silicon Diffused Power Transistor July 1999 Rev 1.000
	BU4506DZ	57Kb/6P	Silicon Diffused Power Transistor January 1999 Rev 1.000
	BU4508AX	59Kb/7P	Silicon Diffused Power Transistor May 1998 Rev 1.000
	BU4508DZ	54Kb/6P	Silicon Diffused Power Transistor February 1999 Rev 1.000
	BU4515AX	42Kb/7P	Silicon Diffused Power Transistor June 1999 Rev 1.000

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What is DIFFUSED

In electronic components, DIFFUSED is a term commonly used in the semiconductor manufacturing process.

In the semiconductor manufacturing process, DIFFUSED generally refers to a technology that dissolves impurities into a semiconductor material and causes an oxidation reaction to create a desired semiconductor device.

These technologies are one of the important processes in determining the characteristics of semiconductor devices.

For example, in semiconductor devices using silicon, diffusion (a technology that causes an oxidation reaction by melting impurities) is commonly used to form a pn junction (positive-negative junction) inside the device.

This pn junction is one of the basic components of diodes, transistors, and integrated circuits used in various electronic components, and is an important factor in determining the electrical characteristics of semiconductor devices.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.

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