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EPITAXIAL Datasheet, PDF

Searched Keyword : 'Epitaxial' - Total: 31 (1/2) Pages
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STMicroelectronics
2N2102 Datasheet pdf image
48Kb/4P
EPITAXIAL PLANAR NPN
2N1711 Datasheet pdf image
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EPITAXIAL PLANAR NPN
BC394 Datasheet pdf image
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EPITAXIAL PLANAR NPN
2N720A Datasheet pdf image
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EPITAXIAL PLANAR NPN
2ST5949 Datasheet pdf image
144Kb/8P
High power NPN epitaxial planar bipolar transistor
2STW1693 Datasheet pdf image
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High power PNP epitaxial planar bipolar transistor
2STW4468 Datasheet pdf image
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High power NPN epitaxial planar bipolar transistor
2STA2121 Datasheet pdf image
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High power PNP epitaxial planar bipolar transistor
2STA2510 Datasheet pdf image
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High power PNP epitaxial planar bipolar transistor
2STW4466 Datasheet pdf image
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High power NPN epitaxial planar bipolar transistor
2SC5200 Datasheet pdf image
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High power NPN epitaxial planar bipolar transistor
2STC5948_0807 Datasheet pdf image
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High power NPN epitaxial planar bipolar transistor
2STC5200 Datasheet pdf image
181Kb/9P
High power NPN epitaxial planar bipolar transistor
2STA1694 Datasheet pdf image
95Kb/7P
High power PNP epitaxial planar bipolar transistor
2STC4467 Datasheet pdf image
96Kb/7P
High power NPN epitaxial planar bipolar transistor
2STC5242 Datasheet pdf image
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High power NPN epitaxial planar bipolar transistor
2STA2120 Datasheet pdf image
161Kb/8P
High power PNP epitaxial planar bipolar transistorl
2STC5949 Datasheet pdf image
144Kb/8P
High power NPN epitaxial planar bipolar transistor
2ST5949_0807 Datasheet pdf image
145Kb/8P
High power NPN epitaxial planar bipolar transistor
2STW1695 Datasheet pdf image
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High power PNP epitaxial planar bipolar transistor

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What is Epitaxial


In electronic components, 'Epitaxial' is a term used in semiconductor manufacturing technology, and refers to a technology that forms a semiconductor layer with a critical growth process. This technology is used to improve the performance of semiconductor devices, especially in silicon-based semiconductor manufacturing.

Epitaxial deposition is the process of depositing one or more additional layers on top of an existing semiconductor prototype. This process is also called epitaxy and is usually done using methods such as Chemical Vapor Deposition (CVD) or Physical Vapor Deposition (PVD).

Epitaxial deposition is used for a variety of purposes:

Improved performance: Improves electron mobility and speed by forming a higher quality crystalline structure than the base material of semiconductor devices.

Doping: In the epitaxial process, specific atoms or ions can be doped to give desired electrical properties.

Improved Stability: The epitaxial layer has the same lattice structure as the underlying prototype, making it more stable than layers formed by other techniques.

Device Integration: Epitaxial processes are used to integrate multiple devices into a single semiconductor chip by depositing multiple layers.

Epitaxial deposition is considered a key technology in semiconductor manufacturing and plays a key role in improving the performance and efficiency of semiconductor devices. This technology forms the basis for the development of a wide range of products in the semiconductor industry, including high-performance microprocessors, memory chips, and LEDs.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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