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DIFFUSED Datasheet, PDF

Searched Keyword : 'DIFFUSED' - Total: 2601 (9/131) Pages
ManufacturerPart #DatasheetDescription
Company Logo Img
Ledil, Inc.
FCP15345 Datasheet pdf image
6Mb/5P
~18째 diffused spot beam
Company Logo Img
KEC(Korea Electronics)
KTA1943A Datasheet pdf image
51Kb/2P
TRIPLE DIFFUSED PNP TRANSISTOR
F1B2CCI Datasheet pdf image
450Kb/2P
STACK SILICON DIFFUSED DIODE
Company Logo Img
NXP Semiconductors
BUJ403A127 Datasheet pdf image
125Kb/9P
Silicon Diffused Power Transistor
December 1998
BUJ105AD Datasheet pdf image
88Kb/12P
Silicon diffused power transistor
Rev. 01-14 December 2004
PHE13005X Datasheet pdf image
444Kb/13P
Silicon diffused power transistor
Rev. 02-20 November 2009
Company Logo Img
KEC(Korea Electronics)
MJE13009 Datasheet pdf image
276Kb/2P
TRIPLE DIFFUSED NPN TRANSISTOR
KTC4521F Datasheet pdf image
460Kb/3P
TRIPLE DIFFUSED NPN TRANSISTOR
KTD1530 Datasheet pdf image
650Kb/3P
TRIPLE DIFFUSED NPN TRANSISTOR
TIP35CA Datasheet pdf image
445Kb/2P
TRIPLE DIFFUSED NPN TRANSISTOR
Company Logo Img
WeEn Semiconductors
BUJ105AD Datasheet pdf image
1Mb/10P
Silicon diffused power transistor
PHE13007 Datasheet pdf image
342Kb/9P
Silicon Diffused Power Transistor
Company Logo Img
Hitachi Semiconductor
2SB1389 Datasheet pdf image
35Kb/6P
Silicon PNP Triple Diffused
2SB566 Datasheet pdf image
33Kb/6P
Silicon PNP Triple Diffused
2SD1559 Datasheet pdf image
36Kb/6P
Silicon NPN Triple Diffused
2SD2104 Datasheet pdf image
35Kb/6P
Silicon NPN Triple Diffused
2SC2898 Datasheet pdf image
40Kb/7P
Silicon NPN Triple Diffused
2SC4647 Datasheet pdf image
28Kb/6P
Silicon NPN Triple Diffused
2SC5022 Datasheet pdf image
34Kb/7P
Silicon NPN Triple Diffused
2SD1115 Datasheet pdf image
32Kb/4P
Silicon NPN Triple Diffused

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What is DIFFUSED


In electronic components, DIFFUSED is a term commonly used in the semiconductor manufacturing process.

In the semiconductor manufacturing process, DIFFUSED generally refers to a technology that dissolves impurities into a semiconductor material and causes an oxidation reaction to create a desired semiconductor device.

These technologies are one of the important processes in determining the characteristics of semiconductor devices.

For example, in semiconductor devices using silicon, diffusion (a technology that causes an oxidation reaction by melting impurities) is commonly used to form a pn junction (positive-negative junction) inside the device.

This pn junction is one of the basic components of diodes, transistors, and integrated circuits used in various electronic components, and is an important factor in determining the electrical characteristics of semiconductor devices.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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