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EPITAXIAL Datasheet, PDF

Searched Keyword : 'Epitaxial' - Total: 1026 (1/52) Pages
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Toshiba Semiconductor
TPS816F Datasheet pdf image
173Kb/6P
Silicon Epitaxial Planar
TPS820 Datasheet pdf image
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Silicon Epitaxial Planar
TPS852 Datasheet pdf image
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Silicon Epitaxial Planar
TPS841 Datasheet pdf image
225Kb/6P
Silicon Epitaxial Planar
TPS842A Datasheet pdf image
226Kb/6P
Silicon Epitaxial Planar
TPS851 Datasheet pdf image
272Kb/12P
Silicon Epitaxial Planar
2SC3298 Datasheet pdf image
109Kb/2P
SILICON NPN EPITAXIAL TYPE
2SA510 Datasheet pdf image
126Kb/3P
SILICON PNP EPITAXIAL TYPE
2SA1195 Datasheet pdf image
126Kb/3P
SILICON PNP EPITAXIAL TRANSISTOR
2SB1481 Datasheet pdf image
137Kb/4P
Silicon PNP Epitaxial Type
2SC5714 Datasheet pdf image
139Kb/5P
Silicon NPN Epitaxial Type
1S2186 Datasheet pdf image
59Kb/2P
SILICON EPITAXIAL PLANAR TYPE
2SC6061 Datasheet pdf image
205Kb/5P
Silicon NPN Epitaxial Type
TPC6501 Datasheet pdf image
175Kb/5P
Silicon NPN Epitaxial Type
2SB1495 Datasheet pdf image
137Kb/4P
Silicon PNP Epitaxial Type
JDV2S22FS Datasheet pdf image
130Kb/3P
Silicon Epitaxial Planar Type
JDV2S28FS Datasheet pdf image
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Silicon Epitaxial Planar Type
2SC6033 Datasheet pdf image
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Silicon NPN Epitaxial Type
2SC6075 Datasheet pdf image
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Silicon NPN Epitaxial Type
TPS610F Datasheet pdf image
209Kb/5P
Silicon NPN Epitaxial Planar

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What is Epitaxial


In electronic components, 'Epitaxial' is a term used in semiconductor manufacturing technology, and refers to a technology that forms a semiconductor layer with a critical growth process. This technology is used to improve the performance of semiconductor devices, especially in silicon-based semiconductor manufacturing.

Epitaxial deposition is the process of depositing one or more additional layers on top of an existing semiconductor prototype. This process is also called epitaxy and is usually done using methods such as Chemical Vapor Deposition (CVD) or Physical Vapor Deposition (PVD).

Epitaxial deposition is used for a variety of purposes:

Improved performance: Improves electron mobility and speed by forming a higher quality crystalline structure than the base material of semiconductor devices.

Doping: In the epitaxial process, specific atoms or ions can be doped to give desired electrical properties.

Improved Stability: The epitaxial layer has the same lattice structure as the underlying prototype, making it more stable than layers formed by other techniques.

Device Integration: Epitaxial processes are used to integrate multiple devices into a single semiconductor chip by depositing multiple layers.

Epitaxial deposition is considered a key technology in semiconductor manufacturing and plays a key role in improving the performance and efficiency of semiconductor devices. This technology forms the basis for the development of a wide range of products in the semiconductor industry, including high-performance microprocessors, memory chips, and LEDs.

*This information is for general informational purposes only, we will not be liable for any loss or damage caused by the above information.


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